It is reported that Aixtron, the world's leading supplier of deposition equipment for the semiconductor industry, said that Plessey has ordered its AIX G5+ C planetary reactor platform. Plessey plans to use the metal organic chemical vapor deposition (MOCVD) system to increase the capacity of silicon-on-GaN (GaN-on-Si) epitaxial wafers for next-generation MicroLED applications.
The AIX G5 + C MOCVD system provides an automatic cassette (C2C) wafer transfer module with two independent chamber configuration options for 8*6" or 5*8" GaN-on-Si wafers in a closed Automatic loading and removal in a cassette environment.
Ai Siqiang said that the automated cleaning technology of the new reactor platform ensures that the equipment is cleaned every time it runs, helping to reduce wafer defect rates and significantly reduce downtime. The new equipment also features faster end and cooling and a higher susceptor unloading temperature to reduce recipe time.
The AIX G5 + C Reactor platform will support Plessey's plans to increase its single-chip MicroLED R&D capabilities using the company's proprietary GaN-on-Si technology.
Plessey says its MicroLEDs have extremely high brightness and pixel density and consume very little power. These performance characteristics have the potential to impact a number of existing applications in traditional display technologies, including LCDs and OLEDs. This MicroLED display combines a very high density RGB pixel array with a CMOS backplane to provide extremely high brightness, low power and high frame rate image sources for wearable electronic devices and head mounted displays as well as augmented reality and virtual reality systems.